CVD金刚石膜片-电子级(Electronic Grade CVD)
CVD金刚石薄膜不仅强度高,透明度高,而且热传导性好,且成本较天然金刚石低,能够制备各种几何形状,理论上对尺寸是没有限制的,在电子、光学、机械等工业领域有广泛的应用前景。
CVD金刚石合成方法的显著进展使得在常规基础上制备适合于辐射探测的金刚石成为可能。CVD方法的不断改进,未来可期大面积同质外延生长的单晶金刚石平板/薄膜。CVD金刚石具有广阔的应用前景,如射频二极管、双极结型晶体管、场效应晶体管、微机电系统和电子工业等。不断的创新和不懈的努力为******剂量计等***领域指明了方向。
产品参数:
Lateral Tolerance : |
+0.2/-0 mm |
Crystallographic Orientation (Miscut) : |
+/-3° |
Face Orientation : |
{100} faces |
Crystallography : |
Typically 100% single sector {100} |
Edges : |
Laser Cut |
Laser Kerf : |
3° |
Edge Orientation : |
<110> edges |
Side Roughness Ra : |
polished, Ra < 5 nm on {100} face |
Thickness Tolerance : |
+/- 0.05 mm |
硼含量 |
<1 ppb |
ChargeCollection Efficiency (CCE) : |
Typically >95% |
Charge Collection Distance (CCD) : |
Typically >475µm, @0.5 V µ/m applied field, for 500 µm plate |
Nitrogen Concentration : |
< 5 ppb |
产品选择:
货号 |
产品描述 |
尺寸(长*宽*厚) |
规格 |
|
Electronic Grade CVD |
2.0*2.0mm*0.50mm |
片 |
|
Electronic Grade CVD |
3.0*3.0mm*0.50mm |
片 |
|
Electronic Grade CVD |
4.5*4.5mm*0.50mm |
片 |
|
Electronic Grade CVD |
2.0*2.0mm*0.30mm |
片 |
|
Electronic Grade CVD |
3.0*3.0mm*0.30mm |
片 |
|
Electronic Grade CVD |
4.5*4.5mm*0.30mm |
片 |