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上海衡鹏实业发展有限公司成立于1999年11月,总部设于上海,系专业化、集成化的电子制造行业综合服务性实业。公司致力于引进国外高端制造设备、精密检测仪器、先进生产材料,服务于国内电子制造行业,以助于国内实业提高产品品质,由制造型向创造型实业迈进。公司依托于中国国内电子制造业的高速发展,产品已涉及消费......

晶圆减薄GNX200BP是全自动晶圆研磨机

产品编号:1046815319                    更新时间:2019-11-07
价格: 来电议定

上海衡鹏实业有限公司

  • 主营业务:回流焊、波峰焊、锡膏、助焊剂
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晶圆减薄GNX200BP是全自动晶圆研磨机
——又称晶圆抛光(Wafer Grinding)
 
 
GNX200BP晶圆研磨/晶圆减薄概要
GNX200BP Wafer Grinding is a fully automatic continuous downfeed grinding machine. Wafers are handled through the machine by a robot, and load/unload arms. Two different stati*** are used for wafer cleaning after the final grind station. Chuck speed, grinding wheel, and grind spindle downfeed rate speeds can be used to manipulate grinder throughput, surface finish, and wheel life. A two-point in-process gauge measuring system controls wafer thickness under grind spindles 1 and 2. A three-point grind spindle angle adjustment mechani*** is utilized for easily maintaining wafer profile (ttv); with the option a motorized adjustment. After completion at the grind station, the wafer transfers to Polish unit automatically. The local polishing unit removes subsurface damage for increased wafer die strength, and the ability to handle final thickness of 50 micr***.
 
 
GNX200BP晶圆研磨/晶圆减薄规格
Maximum wafer-machining diameter of wafer 64” or 8”
Grinding Spindle:  Bearing type                 Air bearing, maximum 3600rpm
                   Motor                        2.2kw,4P,high frequency motor 
                   Rapid feed speed             200mm/min
                   Grind feed speed         1 to 999 μm/min 
Grinding wheel size                         ?250 mm
Index Table: Number of work spindles            3 
             Work spindle Bearing type          Mechanical Bearing, or Air Bearing (optional) 
             Speed of Work Spindles         1 to 600 rpm
Automatic Sizing Device:
        Wafer thickness measuring system        2 point contact in-process gauge 
        Wafer minimum setting size              1 μm 
        Wafer size display range         0to 1.2 mm; extended range software ***ailable
Table Cleaning Device (Grinder side) Water + Ceramic block
Wafer Cleaning Unit (Grinder side)         Water + brush, and spin/rinse dry station
Number of Cassettes                         2 stati*** for each unit (Grinder & Polish unit)
Polish head                                     3 Kw AC servo motor for 10 – 460 rpm 
Oscillation speed                               100–8,000 mm/min.
Head Load                                       50 –999 g//cm2 
Pad size                                 200mm O.D.
Polish table speed                              3 Kw AC servo motor for 50 – 200rpm 
Vacuum Chuck material                           Alumina ceramics (dedicate size of wafer)
Chuck cleaning                                 Brush + Water
Wafer cleaning                                 N.C.W + DI water for Polish surface & Air blow spin dry
 
 
GNX200BP晶圆研磨/晶圆减薄相关产品:
衡鹏供应
GDM300晶圆研磨/晶圆减薄/晶圆抛光/晶圆背抛/Wafer Grinding

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