法国Annealsys MOCVD设备 型号 MC050
实验室研发应用，MOCVD, RTP , RTCVD等多工艺性能,2英寸MOCVD设备。
应用：在硅基片，玻璃，太阳能电池多晶硅，化合物半导体基片上长金属和合金，过渡金属元素氮化物，碳纳米管，纳米线等膜层
适应基片类型
•外延沉积用单水晶基片
设备优越性能
• Compatibility with a wide range of precursors
•兼容宽范围源
=> High versatility for Research and Development applicati***
=>多用途适用于研究和开发应用
• State of the art liquid delivery and vaporization system
•液体传送和蒸发系统技术水平
=> Capability to vaporize a wide range of chemical precursors
=>适用于蒸发宽范围化学源
=> Capability to use thermally unstable precursors
=>适用于使用热不稳定源
• Process gas inlet separated from precursor inlet
•工艺气体进口与源进口隔离
=> No reaction outside of the substrate deposition area, no clogging
=>基片沉淀区域外无反应，无堵塞
• Easy di***antling, cleaning and installation of the reactor
•便于拆卸，清洗和安装反应器
=> Easy switching from one material to another
=>便于一种金属到另一种金属的转换
=> Easy service
=>便于维护
=> Low Cost of ownership
=>客户低消耗
• Full rising capability of the liquid panel
•液体面板满提升性能
=> No cross contamination, no need to di***antle liquid lines
=> 无交叉污染，无需拆除液体管路
设备主要特性
- •Horizontal quartz tube with stainless steel flanges
- •配有不锈钢法兰的水平石英管
- • Lamp furnace for process up to 1200℃
- •工艺灯炉，***高至1200℃
- • Thermocouple control with PID temperature controller
- •热电偶的控制器通过温度控制器的PID实现
- • Up to 6 precursors or precursor mixtures
- •***多6个源或源混合
- • Downstream pressure control
- •下流压力控制
- • Purge gas line with needle valve
- •配有针阀的吹扫气路
- • Up to 6 process gas lines with digital MFC
- •配有数字MFC，***多6条工艺气路
- • PC control with Ethernet communication
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•以太网PC控制
设备设计
- • Compatible with a wide range of liquid vaporizers
- •适用宽范围的液体蒸发器
- • Up to 6 precursor liquid lines
- •***多6条源液体管路
- • Optimized organometallic chemical liquid line panel
- •***优的有机金属化学液体管路面板
- • Manual or automatic procedure for chemical cleaning of liquid lines
- •手动或自动程序化学清洁液体管路
- • Reacting compounds connecti*** on chamber (H2O, O3…)
- •腔室内反应复合物连接
- • Gas panel for CVD applicati***
- •CVD应用气体面板