法国Annealsys MC100 MOCVD设备，R&D应用4英寸MOCVD设备
应用：在硅基片，玻璃，太阳能电池多晶硅，化合物半导体基片上长金属和合金，过渡金属元素氮化物，碳纳米管，纳米线等膜层
应用
• Semiconductor: SiO2, HfO2, Ta2O5, Cu, TiN, TaN, …
•半导体： : SiO2, HfO2, Ta2O5, Cu, TiN, TaN, …
• High k Dielectric: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)
•高K绝缘体: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)
• Ferroelectric: SBT, SBTN, PLZT, PZT,…
•铁电物质: SBT, SBTN, PLZT, PZT,…
• Superconductor: YBCO, Bi-2223, Bi-2212, Tl-1223, …
•超导体： : YBCO, Bi-2223, Bi-2212, Tl-1223, …
• Piezoelectric: (Pb, Sr)(Zr,Ti)O3, Modified Lead Titanate
•压电的: (Pb, Sr)(Zr,Ti)O3,改良钛酸铅
• Metals: Pt, Cu, …
•金属： : Pt, Cu, …
• Carbon nanotubes, nanowires
•碳纳米管，纳米线
• Colossal Magneto Resistance
•大型磁致电阻
• Thermal coatings
•热涂层
• Buffer layers
•缓冲膜层
• Mechanical coatings
•机械涂层
• Optics
•光学
• Etc…
•等等
基片类型
• Semiconductor: SiO2, HfO2, Ta2O5, Cu, TiN, TaN, …
•半导体： : SiO2, HfO2, Ta2O5, Cu, TiN, TaN, …
• High k Dielectric: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)
•高K绝缘体: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)
• Ferroelectric: SBT, SBTN, PLZT, PZT,…
•铁电物质: SBT, SBTN, PLZT, PZT,…
• Superconductor: YBCO, Bi-2223, Bi-2212, Tl-1223, …
•超导体： : YBCO, Bi-2223, Bi-2212, Tl-1223, …
• Piezoelectric: (Pb, Sr)(Zr,Ti)O3, Modified Lead Titanate
•压电的: (Pb, Sr)(Zr,Ti)O3,改良钛酸铅
• Metals: Pt, Cu, …
•金属： : Pt, Cu, …
• Carbon nanotubes, nanowires
•碳纳米管，纳米线
• Colossal Magneto Resistance
•大型磁致电阻
• Thermal coatings
•热涂层
• Buffer layers
•缓冲膜层
• Mechanical coatings
•机械涂层
• Optics
•光学
• Etc…
•等等
设备特性
• Stainless steel thermally controlled chamber technology*
•不锈钢热控制腔室技术*
• Rotating and heating substrate holder up to 850°C
•旋转加热基片托，最高至850°C
• Substrate holder with vertical motion
•基片托垂直运动
• Up to 4 precursors or precursor mixtures
•最多4个源或源混合
• Vaporizer reactor by-pass
•蒸发器反应器支路
• Thermocouple control with PID temperature controller
•热电偶的控制器通过温度控制器的PID实现
• Vacuum and pressure control
•真空和压力控制
• Purge gas line with needle valve
•配有针阀的吹扫气路
• Up to 6 process gas lines with digital MFC
•配有数字MFC，最多6条工艺气路
• PC control with Ethernet communication
•以太网PC控制
设备的最优设计
• Compatible with a wide range of liquid vaporizers
•适用宽范围的液体蒸发器
• Up to 4 precursor liquid lines
•最多4个源液体管路
• Optimized organometallic chemical liquid line panel
•最优的有机金属化学液体管路面板
• Manual or automatic procedure for chemical cleaning of liquid lines
•手动或自动程序化学清洁液体管路
• Up to 2 chemical reacting compounds connections on chamber (H2O, O3…)
•最多2个化学反应复合物与腔室连接(H2O, O3…)
• Heated by-pass valve up to 300℃
•支路阀加热，最高至300℃
• Vertical linear motion mechanism up to 100mm
•垂直线性运动机能，最高至100mm
• Gas panel for CVD applications
•CVD应用气体面板