法国Annealsys LPCVD 低压化学气相沉积设备，,提供LC100单管和LC102双管2种配置的选择。完全PC软件控制，4英寸LPCVD批量生产退火炉。应用于长二氧化硅，非晶硅，多晶硅膜等工艺。LC100和LC102致力于R&D应用广泛。
应用
- • LPCVD processes
- •LPCVD工艺
- • Poly silicon deposition
- •多晶硅沉淀
- • Low stress silicon Nitride deposition
- •低应力氮化硅沉淀
- • Silicon dioxide deposition
- •二氧化硅沉淀
- • Annealing
- •退火
- • Oxidation
- •氧化
- • Etc.
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•等等
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The LC100 and LC102 are flexible tools dedicated to R&D
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LC100和LC102致力于R&D应用广泛
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They can be customized upon request for special applications
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设备经需求可提供客户定制的特殊应用
设备特性
- • Multi-zone resistor furnace with LPCVD capability
- •多区电阻炉退火炉具备LPCVD性能
- • Quartz tube with stainless steel flanges
- •石英管配有不锈钢法兰
- • Digital PID temperature controllers
- •数字PID温度控制器
- • Thermocouple control
- •热电偶
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• Atmospheric and vacuum process capability
- 大气和真空工艺性能
- • Pressure control with throttle valve
- •配有节流阀的压力控制
- • Purge gas line with needle valve
- •配有针阀的吹扫气路
- • Up to 12 process gas lines with digital MFC
- •最多12条配有数字MFC的工艺气路
- • Double tube version (LC102) to avoid cross contamination
- •双管版本（LP102）避免交叉污染
- • PC control with Ethernet communication for fast data logging
- •配有以太网通讯的PC控制用于快速数据记录
- • Optional turbo pump
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•可选配涡轮泵
PC完全控制软件
- • Multi-zone resistor furnace with LPCVD capability
- •多区电阻炉退火炉具备LPCVD性能
- • Quartz tube with stainless steel flanges
- •石英管配有不锈钢法兰
- • Digital PID temperature controllers
- •数字PID温度控制器
- • Thermocouple control
- •热电偶
-
• Atmospheric and vacuum process capability
- 大气和真空工艺性能
- • Pressure control with throttle valve
- •配有节流阀的压力控制
- • Purge gas line with needle valve
- •配有针阀的吹扫气路
- • Up to 12 process gas lines with digital MFC
- •最多12条配有数字MFC的工艺气路
- • Double tube version (LC102) to avoid cross contamination
- •双管版本（LP102）避免交叉污染
- • PC control with Ethernet communication for fast data logging
- •配有以太网通讯的PC控制用于快速数据记录
- • Optional turbo pump
- •可选配涡轮泵